Sub-100nm processes are becoming a critical trend in the development of HV-CMOS pixel detector technology. To evaluate the impact of in-pixel electronics design on HV-CMOS pixel sensor performance at these advanced process nodes, we have designed and submitted a prototype chip named COFFEE2, fabricated using a 55nm HV-CMOS process. This chip features a pixel array of 32 rows by 20 columns,...
Technology Computer-Aided Design (TCAD) simulations were conducted on High Voltage CMOS (HV-CMOS) sensors with varying substrate resistivities. The simulations investigated how changes in substrate resistivity affect leakage current, breakdown voltage, the depletion region, and the distribution of high electric field areas within the sensor. The effects of pixel gap and p-stop on capacitance...