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1–6 Nov 2026
Dongguan Exhibition International Hotel
Asia/Shanghai timezone

The Design and Operation of SHINE Machine Protection System

2 Nov 2026, 15:00
20m
Dongguan Exhibition International Hotel

Dongguan Exhibition International Hotel

Speaker

春蕾 于 (中国科学院上海高等研究院)

Description

Shanghai HIgh repetitioN rate XFEL and Extreme light facility (SHINE) interlock system comprises approximately 100 equipment cabinets and 10 000 interlock hardware signals. With the ongoing installation and commissioning of the SHINE facility, the scale of signals integrated into the interlock system continues to expand. This study aims to improve the efficiency of system development and maintenance, as well as to enable rapid fault localization and identification, while fulfilling the basic protection functions. This research focused on the SHINE interlock system. The hardware design, software templates, and signal interface protocols were standardized. An automated generation approach was implemented to produce interlock software for both the Input/Output Controller (IOC) layer and operator interface layer. Furthermore, a top-down interface design was adopted, integrating multi-dimensional data, including sector-specific views, subsystem statuses, comprehensive machine parameters, and visual/auditory alarms, into a unified supervisory framework. The development and implementation of these functionalities significantly reduce the workload of repetitive coding, and the automated generation process achieve a 100% correctness rate in EPICS control system development. Fault indication and diagnostic capabilities are substantially improved, enabling localization of typical interlock events within seconds. The final deployed system manages all 10 000 hardware signals with full functional coverage. Currently, the automated interlock program and the overall interface design have been completed and successfully deployed in SHINE.

Primary author

春蕾 于 (中国科学院上海高等研究院)

Presentation materials

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