21–24 Oct 2025
Sheraton Hong Kong Hotel & Towers
Asia/Shanghai timezone

VUV Reflectivity Measurements for Materials Relevant to Argon and Xenon Experiments

24 Oct 2025, 10:00
20m
Sheraton Hong Kong Hotel & Towers

Sheraton Hong Kong Hotel & Towers

20 Nathan Road, Kowloon Tsim Sha Tsui, Hong Kong, China
Oral Presentation Light/charge response in Noble Elements (gas, liquid, dual phase) Light/charge response in Noble Elements

Speaker

Jose A. Soto-Oton (UvA/Nikhef)

Description

We present the development and initial results of an experimental setup designed to measure the vacuum ultraviolet (VUV) reflectivity of materials commonly used in argon and xenon-based detectors. The system consists of a monochromator coupled to a sealed black box chamber filled with ultra-pure argon gas. A photosensor mounted on a motorized rotation stage enables angular-resolved measurements, allowing the separation of specular and diffuse reflectivity components. Measurements focus on key VUV wavelengths: 128 nm and 175 nm, corresponding to the scintillation light of liquid argon and liquid xenon, respectively. Preliminary results are shown for materials such as aluminum and stainless steel, highlighting their diffuse reflectivity behavior and the relevance of these measurements for detector design, simulation, and optimization.

Primary author

Jose A. Soto-Oton (UvA/Nikhef)

Presentation materials